Exploratory materials
Develop and screen metal, oxide, nitride, carbon, polymer-compatible and hybrid thin-film stacks before transferring mature processes to larger infrastructure.
Industries we serve
Moorfield platforms support exploratory thin-film, plasma and thermal workflows where researchers need quick process access, unusual material flexibility and a lower-friction path from idea to usable process data.
Develop and screen metal, oxide, nitride, carbon, polymer-compatible and hybrid thin-film stacks before transferring mature processes to larger infrastructure.
Create a local sandbox for non-standard materials, contamination-sensitive trials and rapid experimental changes.
Use benchtop plasma cleaning and RIE for research-scale surface activation, soft etch and materials studies.
Use local anneal capability to explore crystallisation, contact improvement and material-property changes.
Benchtop sputtering and evaporation for rapid materials iteration.
RIE and plasma cleaning for specialist materials and surfaces.
Modular capacity for complex stacks, larger chambers and specialist source configurations.
Moorfield application examples include nanoPVD metal electrode deposition, graphene-related workflows, fluorine etching of h-BN/SiO2/Si, Ti film sputtering and ceramic/metal thin-film studies. Bioz-linked Moorfield results also point to nanoPVD and MiniLab use across advanced materials publications.
nanoPVD: Benchtop Metal Electrode Deposition
nanoETCH: Fluorine etching with the nanoETCH
Bioz: nanoPVD systems publication signal
Advanced materials groups often need a practical approach for rapid thin-film, plasma and thermal experiments before committing time on larger shared infrastructure. Compact Moorfield platforms provide local access for small-batch process development, unusual material studies and fast recipe iteration.