Research Flexibility Without Enterprise Complexity
Benchtop Systems for Thin-Film, Anneal & Etch Research
Compact deposition, annealing and plasma processing systems designed for advanced materials research, semiconductor development and next-generation thin-film applications.
Built around flexible research workflows
Moorfield platforms are designed for universities, R&D facilities and pilot-scale innovation teams that need advanced process capability without enterprise-scale infrastructure complexity.
Benchtop Systems
Compact Moorfield platforms for research teams that need local access to thin-film deposition, thermal processing and plasma etch capability.
nanoPVD-S10A
Sputtering
Compact RF and DC magnetron sputtering for conductive and insulating materials.
nanoPVD-S10A-WA
Wide-area sputtering
Configuration for larger research substrates and coating areas.
nanoPVD-T15A
Evaporation
Thermal and low-temperature evaporation for metals, organics and sensitive materials.
nanoPVD-ST15A
Combined PVD
Combined sputtering and thermal evaporation within one compact research platform.
nanoETCH
Plasma etch
Benchtop plasma etching and surface preparation for research-scale materials and device workflows.
nanoANNEAL
Thermal process
Benchtop vacuum annealing and thermal process development under controlled atmosphere.
Key benefits
Compact Research Infrastructure
Reduce laboratory space and facility requirements.
Flexible Process Development
Support sputtering, thermal evaporation and multi-layer deposition workflows.
Faster Experimental Iteration
Optimised for process development rather than production-only operation.
Lower Total Cost of Ownership
Advanced deposition capability without large-scale manufacturing infrastructure.
Applications
- Semiconductor thin films
- Optical coatings
- Thin-film batteries
- Nanomaterials
- Surface engineering
- MEMS
- Quantum materials
- Functional coatings