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Quick comparison

Compare nanoPVD and MiniLab platforms

Use these tables as a first-pass guide to the main platform differences. Final specification depends on source configuration, substrate requirements, process gases, transfer needs and order-specific options.

Quick Comparison: nanoPVD Benchtop Range

The nanoPVD range covers compact benchtop systems for sputtering, thermal evaporation and combined process approaches.

FeatureS10AS10A-WAT15AST15A
Sputtering (DC/RF magnetron)YesYesNoYes
Thermal / LTE evaporationNoNoYesYes
Hybrid (sputter + evaporate)NoNoNoYes
Reactive sputtering (MFC gas control)YesYesNoYes
Water-cooled magnetronsYesYesNoYes
Substrate heating up to 500°CYesYesYesYes
Glovebox compatibleNoNoNoNo
Max substrate size4" (100 mm)8" (200 mm)4" (100 mm)4" (100 mm)
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Quick Comparison: MiniLab Range

The MiniLab range provides modular PVD platforms across compact, glovebox-compatible, e-beam, sputtering, evaporation and larger research-platform configurations.

Feature026030070080090125
Sputtering (magnetron)YesYesYesYesYesYes
E-beam evaporationNoYesNoYesYesYes
Thermal / LTE evaporationYesYesYesYesYesYes
HiPIMS / pulsed DCYesYesYesYesYesYes
Substrate heating up to 800°CNoYesYesYesYesYes
Substrate coolingNoYesYesYesYesYes
Substrate bias (RF + DC)NoYesYesYesYesYes
Load Lock (up to 8″ substrates)NoNoYesYesYesYes
Glovebox compatibleYesYesNoNoYesNo
Dual chamberNoNoYesYesYesYes
Max substrate size6" (150 mm)6" (150 mm)8" (200 mm)8" (200 mm)8" (200 mm)12" (300 mm)
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Many features are configurable at order. Contact Moorfield to confirm the best specification for your application.